Browse the facilities and equipment in the Nanofabrication Core Lab
The Nanofabrication Core Lab provides equipment for processing and fabrication including thin films deposition and modification, micro and nano-scale patterning, mask writing, wafer dicing, process integration and characterization. The instruments are well-maintained with standard operating procedures which ensure quality performance and interruption-free operation.
Learn more about the Nanofabrication Core Lab including latest news, events, and jobs
Explore how you can use Nanofabrication Core Lab services
Find out about the technical expertise offered by staff in the Nanofabrication Core Lab
The cleanroom is a controlled environment where the levels of particulates, microbes and contaminations in the air are minimized by continuously flushing the room with highly filtered air. The facility has 2,000 square meters of class 1000 space and multiple bays at class 100. The environment is controlled at 22°C temperature and 44% relative humidity. The facility is fully-equipped with versatile processing equipment and a full complement of utilities.
The Nanofabrication Core Lab houses advanced exposure tools, employing both optical and electron beam techniques. This enables patterning of features as small as 10nm – that's 10,000 times smaller than the diameter of a human hair. The in-house mask shop has the capability to write and develop masks with a resolution of 700nm. We also provide various coaters, developers, hot plates and surface preparation tools for resist processing.
Physical vapor deposition and chemical vapor deposition are two important methods for deposition of thin films which are important building materials for semiconductor devices and other micro/nano devices. Our cleanroom houses sputter, electron beam evaporator, plasma enhanced chemical vapor deposition, low-pressure chemical vapor deposition, and atomic layer deposition tools to deposit various metal, dielectric and insulating films. We also provide thermal diffusion processes which are necessary for fabricating active layers in transistors.
Dry and wet etching facilities are available for the removal of layers from the surface of materials. The cleanroom is equipped with plasma etching machines that are connected to reactive gasses (fluorides and chlorides) and can be used to etch more than fifty materials. We provide ion beam (argon-based) etching which can produce sub-micron dense and isolated features with minimal edge roughness. We also provide wet benches with various chemicals which can be used to etch metals, semiconductors and insulators. Lastly, pre-clean benches are available for preparing wafers to ensure minimal contamination.
Metrology is the science of measurement which ensures device fabrication is in accordance with the design. We offer versatile metrology facilities such as thickness measurement, profilometry, optical properties, 3D imaging, conductivity and stress measurements. After fabrication, the chip has to be packaged for use outside the cleanroom environment. The tools available for that are the dicing saw and wire bonder. The wafer dicer can be used to cleave a whole wafer into small functional pieces, and the wire bonder is for making interconnections between the functional piece and the packaging pins.
The thin films facility is a film-growing laboratory for fundamental and applied research of the physical and chemical properties of films and their relevant devices such as optical, catalytic converters, magnetic and ferroelectric and spintronic devices, magnetic sensors and carbon nanotube transistors. The lab hosts a broad range of film fabrication tools and characterization facilities.
The microfluidic section of the Nanofabrication Core Lab offers versatile fabrications techniques, such as laser etching of polymers and thin metal sheets, maskless lithography and mechanical machining down to 100-micrometer dimensions.
Various characterization tools such as viscosity measuring equipment, microfluidics probe stations, and a profilometer for channel height measurements are also available.
The Nanofabrication Core Lab is located in Building 3, Level 0, West
Contact us for more information about the Core Labs
Tour the facility to learn how we can help accelerate your research
We are always looking to add to our dynamic team